In past decades, miniaturization of materials was immanent in all fields of technology, especially in semiconductor industry. Nowadays, miniaturization of semiconducting compounds has reached a level where established manufacturing processes reach their technical limits. Atomic Layer Deposition (ALD) offers an alternative method for the deposition of ultra-thin metallic films, which is a crucial step in the fabrication of semiconducting compounds. Based on a chemical reaction between surface and gas phase, ALD is a process which touches both synthetic chemistry and...